Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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====Linewidth and sidewall angle vs defocus parameter (AZ 5214E)==== | ====Linewidth and sidewall angle vs defocus parameter (AZ 5214E)==== | ||
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'''Result of image analysis of SEM images of 2µm triplets:''' | |||
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|[[Image:5214E_Profile vs defoc.jpg|500px]] | |||
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| Linewidth and sidewall angle vs. defocus value for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle. | |||
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'''SEM images of 1.5µm AZ 5214E as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:''' | '''SEM images of 1.5µm AZ 5214E as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:''' | ||
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|[[Image:W33 MLA2 5214 F5 D95_02.jpg|280px]] | |[[Image:W33 MLA2 5214 F5 D95_02.jpg|280px]] | ||
|[[Image:W33 MLA2 5214 F12 D95_102.jpg|280px]] | |[[Image:W33 MLA2 5214 F12 D95_102.jpg|280px]] | ||
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