Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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==AZ 5214E== | ==AZ 5214E== | ||
===Resolution=== | ===Resolution (AZ 5214E)=== | ||
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'''Resolution at optimal processing conditions for 1.5µm AZ 5214E using different exposure equipment:''' | '''Resolution at optimal processing conditions for 1.5µm AZ 5214E using different exposure equipment:''' | ||
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===Yield=== | ===Yield (AZ 5214E)=== | ||
The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines. | The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines. | ||
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===Resist profile=== | ===Resist profile (AZ 5214E)=== | ||
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====Linewidth and sidewall angle vs exposure dose==== | ====Linewidth and sidewall angle vs exposure dose (AZ 5214E)==== | ||
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====Linewidth and sidewall angle vs defocus parameter==== | ====Linewidth and sidewall angle vs defocus parameter (AZ 5214E)==== | ||
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==AZ MiR 701== | ==AZ MiR 701== | ||
===Resolution=== | ===Resolution (AZ MiR 701)=== | ||
* Table with optimal parameters and resolution for different aligners | * Table with optimal parameters and resolution for different aligners | ||
* SEM pictures | * SEM pictures | ||
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===Resist profile=== | ===Resist profile (AZ MiR 701)=== | ||
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====Linewidth and sidewall angle vs exposure dose==== | ====Linewidth and sidewall angle vs exposure dose (AZ MiR 701)==== | ||
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====Linewidth and sidewall angle vs defocus parameter==== | ====Linewidth and sidewall angle vs defocus parameter (AZ MiR 701)==== | ||
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==AZ nLOF 2020== | ==AZ nLOF 2020== | ||
===Resolution=== | ===Resolution (AZ nLOF 2020)=== | ||
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===Resist profile ( | ===Resist profile (AZ nLOF 2020)=== | ||
*SEM pictures to support graphs? | *SEM pictures to support graphs? | ||