Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
Appearance
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|[[Image:W18 MA62 MiR vac D250_F3T_02.jpg|280px]] | |[[Image:W18 MA62 MiR vac D250_F3T_02.jpg|280px]] | ||
|[[Image:W18 MA62 MiR vac D280_D5B_02.jpg|280px]] | |[[Image:W18 MA62 MiR vac D280_D5B_02.jpg|280px]] | ||
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'''SEM images of 1.5µm AZ MiR 701 as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:''' | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
! | |||
!225mJ/cm<sup>2</sup> | |||
!275mJ/cm<sup>2</sup> | |||
!325mJ/cm<sup>2</sup> | |||
!375mJ/cm<sup>2</sup> | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|2µm triplets | |||
|[[Image:W15 MLA2 MiR F2 D225_04.jpg|280px]] | |||
|[[Image:W15 MLA2 MiR F2 D275_03.jpg|280px]] | |||
|[[Image:W15 MLA2 MiR F2 D325_03.jpg|280px]] | |||
|[[Image:W15 MLA2 MiR F2 D375_03.jpg|280px]] | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Lines | |||
|[[Image:W15 MLA2 MiR F2 D225_01.jpg|280px]] | |||
|[[Image:W15 MLA2 MiR F2 D275_02.jpg|280px]] | |||
|[[Image:W15 MLA2 MiR F2 D325_01.jpg|280px]] | |||
|[[Image:W15 MLA2 MiR F2 D375_01.jpg|280px]] | |||
|} | |} | ||