Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

@@ Line 388: / Line 388: @@
 <br clear="all" />
-===Resist profile (sidewall angle and linewidth)===
+===Resist profile===
-*SEM pictures to support graphs?
+<br clear="all" />
+====Linewidth and sidewall angle vs exposure dose====
+<br clear="all" />
+'''SEM images of 1.5µm AZ MiR 701 as a function of exposure dose for Aligner: MA6-2 using vacuum contact:'''
+{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
+|-
+|-
+|-style="background:silver; color:black"
+!
+!160mJ/cm<sup>2</sup>
+!190mJ/cm<sup>2</sup>
+!220mJ/cm<sup>2</sup>
+!250mJ/cm<sup>2</sup>
+!280mJ/cm<sup>2</sup>
+|-
+|-
+|-style="background:WhiteSmoke; color:black"
+|2µm triplets
+|[[Image:W18 MA62 MiR vac D160_F8T_03.jpg|280px]]
+|[[Image:W18 MA62 MiR vac D190_H6B_03.jpg|280px]]
+|[[Image:W18 MA62 MiR vac D220_I3T_03.jpg|280px]]
+|[[Image:W18 MA62 MiR vac D250_F3T_03.jpg|280px]]
+|[[Image:W18 MA62 MiR vac D280_D5B_03.jpg|280px]]
+|-
+|-style="background:WhiteSmoke; color:black"
+|Lines
+|[[Image:W18 MA62 MiR vac D160_F8T_02.jpg|280px]]
+|[[Image:W18 MA62 MiR vac D190_H6B_02.jpg|280px]]
+|[[Image:W18 MA62 MiR vac D220_I3T_02.jpg|280px]]
+|[[Image:W18 MA62 MiR vac D250_F3T_02.jpg|280px]]
+|[[Image:W18 MA62 MiR vac D280_D5B_02.jpg|280px]]
+|}
+<br clear="all" />
 '''Result of image analysis of SEM images of 2µm triplets:'''