Specific Process Knowledge/Lithography/EBeamLithography/Nanobook: Difference between revisions
Appearance
| Line 19: | Line 19: | ||
== Pattern generation == | == Pattern generation == | ||
Converting this amount of text is not easily done through any regular mask layout tool. Thus, a custom python script was developed which can take a simple text file and convert it to a GDS layout. [[File:MobyDick.gds | Converting this amount of text is not easily done through any regular mask layout tool. Thus, a custom python script was developed which can take a simple text file and convert it to a GDS layout. [[File:MobyDick.gds The resulting GDS file can be downloaded here]] and viewed in any GDS editor. For the actual exposure a scale of 0.6 was applied to the pattern resulting in a pattern size of 192 x 240 µm^2. The target linewidth of the letters at this scale is just about 30 nm. | ||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | {| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | ||