Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

@@ Line 123: / Line 123: @@
 ! width="460" |
-|+'''Wafer maps at optimal processing conditions for different aligners'''
+|+'''Wafer maps for 1.5µm AZ 5214E at optimal processing conditions for different aligners'''
 |- border="0" align="center"
 |[[Image:Map_MLA2_D90_F2.jpg|450px]]
@@ Line 140: / Line 140: @@
 ! width="460" |
-|+'''Wafer maps at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
+|+'''Wafer maps for 1.5µm AZ 5214E at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
 |- border="0" align="center"
 |[[Image:Map_MA6-2_hard.jpg|450px]]
@@ Line 156: / Line 156: @@
 ! width="460" |
-|+'''Wafer maps at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm<sup>2</sup>, probably over-exposed)'''
+|+'''Wafer maps for 1.5µm AZ 5214E at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm<sup>2</sup>, probably over-exposed)'''
 |- border="0" align="center"
 |[[Image:Map_MA6-1_hard.jpg|450px]]
@@ Line 172: / Line 172: @@
 ! width="460" |
-|+'''Wafer maps at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
+|+'''Wafer maps for 1.5µm AZ 5214E at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
 |- border="0" align="center"
 |[[Image:Map_MA6-2_soft_WEC015.jpg|450px]]