Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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-'''SEM images as a function of exposure dose for Aligner: MA6-2 using vacuum contact:'''
+'''SEM images of 1.5µm AZ 5214E as a function of exposure dose for Aligner: MA6-2 using vacuum contact:'''
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-'''SEM images as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:'''
+'''SEM images of 1.5µm AZ 5214E as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:'''
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-'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
+'''SEM images of 1.5µm AZ 5214E as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
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