Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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|[[Image:W06 MLA1 nLOF D220 F-4_01.jpg|400px]] | |[[Image:W06 MLA1 nLOF D220 F-4_01.jpg|400px]] | ||
|[[Image:W06 MLA1 nLOF D220 F-4_03.jpg|400px]] | |[[Image:W06 MLA1 nLOF D220 F-4_03.jpg|400px]] | ||
|} | |||
<br clear="all" /> | |||
'''Cross-sectional SEM images at optimal processing conditions for 2µm AZ nLOF 2020:''' | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
! | |||
!2µm lines | |||
!2µm trenches | |||
!Lines | |||
!Trenches | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Aligner: Maskless 01 (MLA1) | |||
220mJ/cm<sup>2</sup>, Defoc -4 | |||
|[[Image:w04_mla1_nLOF_D220_F-4_X_l_2um.jpg|280px]] | |||
|[[Image:w04_mla1_nLOF_D220_F-4_X_t_2um.jpg|280px]] | |||
|[[Image:w04_mla1_nLOF_D220_F-4_Xlines.jpg|280px]] | |||
|[[Image:w04_mla1_nLOF_D220_F-4_Xtrench.jpg|280px]] | |||
|} | |} | ||