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Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,794 edits
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| colspan="2" | Linewidth and sidewall angle vs. defocus value  for 2µm AZ nLOF exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm<sup>2</sup> and Aligner: Maskless 02 (MLA2) using dose 450mJ/cm<sup>2</sup>, respectively. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.   
| colspan="2" | LWidth of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).   
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