Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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[[Image:MiR_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 275mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]] | [[Image:MiR_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 275mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]] | ||
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'''Result of image analysis of SEM images of 2µm triplets:''' | |||
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|[[Image:MiR_Linewidth vs dose.jpg|500px]] | |||
|[[Image:MiR_Sidewall vs dose.jpg|500px]] | |||
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| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). | |||
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