Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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!Exposure equipment | !Exposure equipment | ||
!Dose | !Dose [mJ/cm<sup>2</sup>] | ||
!Contact/Defoc | !Contact/Defoc | ||
!Resolution | !Resolution [µm] | ||
!Comment | !Comment | ||
|- | |- | ||
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|Vacuum | |Vacuum | ||
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|275 | |275 | ||
|2 | |2 | ||
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|} | |} | ||