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Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,834 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,834 edits
Line 23: Line 23:
|+
|+
!Exposure equipment
!Exposure equipment
!Dose
!Dose [mJ/cm<sup>2</sup>]
!Contact/Defoc
!Contact/Defoc
!Resolution
!Resolution [µm]
!Comment
!Comment
|-
|-
Line 31: Line 31:
|100
|100
|Vacuum
|Vacuum
|1µm
|1
|
|
|-
|-
Line 37: Line 37:
|100
|100
|Vacuum
|Vacuum
|1.25µm
|1.25
|Probably over-exposed
|Probably over-exposed
|-
|-
Line 43: Line 43:
|90
|90
|2
|2
|1.25µm
|1.25
|
|
|}
|}
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