Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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* Table with optimal parameters and resolution for different aligners | * Table with optimal parameters and resolution for different aligners | ||
* SEM pictures | * SEM pictures | ||
'''Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:''' | |||
{| class="wikitable" | |||
|+ | |||
!Exposure equipment | |||
!Dose | |||
!Contact/Defoc | |||
!Resolution | |||
!Comment | |||
|- | |||
|Aligner: MA6-2 | |||
|154 | |||
|Vacuum | |||
|1µm | |||
| | |||
|- | |||
|Aligner: Maskless 01 (MLA1) | |||
|220 | |||
|-4 | |||
|2µm | |||
| | |||
|- | |||
|Aligner: Maskless 02 (MLA2) | |||
|450 | |||
|0 | |||
|1.25µm | |||
| | |||
|} | |||
<br clear="all" /> | |||
===Resist profile (sidewall angle and linewidth)=== | ===Resist profile (sidewall angle and linewidth)=== | ||