Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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===Resist profile (linewidth and sidewall angle)=== | ===Resist profile (linewidth and sidewall angle)=== | ||
====Linewidth and sidewall angle vs exposure dose==== | |||
'''SEM images of 2µm triplets as a function of exposure dose:''' | '''SEM images of 2µm triplets as a function of exposure dose:''' | ||
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====Linewidth and sidewall angle vs defocus parameter==== | |||
'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2):''' | '''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2):''' | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|2µm triplets | |2µm triplets | ||
|[[Image: | |[[Image:W33 MLA2 5214 F-8 D95_101.jpg|280px]] | ||
|[[Image: | |[[Image:W33 MLA2 5214 F-1 D95_01.jpg|280px]] | ||
|[[Image: | |[[Image:W33 MLA2 5214 F2 D95_01.jpg|280px]] | ||
|[[Image: | |[[Image:W33 MLA2 5214 F5 D95_01.jpg|280px]] | ||
|[[Image: | |[[Image:W33 MLA2 5214 F12 D95_101.jpg|280px]] | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Lines | |Lines | ||
|[[Image: | |[[Image:W33 MLA2 5214 F-8 D95_102.jpg|280px]] | ||
|[[Image: | |[[Image:W33 MLA2 5214 F-1 D95_02.jpg|280px]] | ||
|[[Image: | |[[Image:W33 MLA2 5214 F2 D95_1_02.jpg|280px]] | ||
|[[Image: | |[[Image:W33 MLA2 5214 F5 D95_02.jpg|280px]] | ||
|[[Image: | |[[Image:W33 MLA2 5214 F12 D95_102.jpg|280px]] | ||
|} | |} | ||
'''Result of image analysis of SEM images of 2µm triplets:''' | |||
{| cellpadding="2" style="border: 2px solid darkgray;" align="left" | {| cellpadding="2" style="border: 2px solid darkgray;" align="left" | ||
! width="510" | | ! width="510" | | ||