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Specific Process Knowledge/Thin film deposition: Difference between revisions

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*[[/Alcatel|Alcatel]] - ''E-beam evaporator and sputter tool''
*[[/Alcatel|Alcatel]] - ''E-beam evaporator and sputter tool''
*[[/Lesker|Lesker]] - ''Sputter tool''
*[[/Lesker|Lesker]] - ''Sputter tool''
*[[/Leybold|Leybold]] - ''E-beam evaporator and multiple wafer tool''
*[[/Multisource_PVD|PVD co-sputter/evaporation]] - ''E-beam evaporator and multiple wafer tool''  
*[[/Multisource_PVD|PVD co-sputter/evaporation]] - ''E-beam evaporator and multiple wafer tool''  
*[[/Wordentec|Wordentec]] - ''E-beam evaporator, sputter and thermal evaporator''
*[[/Wordentec|Wordentec]] - ''E-beam evaporator, sputter and thermal evaporator''