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Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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3,655 edits
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''


[[Category: Equipment|Lithography exposure]]
[[index.php?title=Category:Equipment|Lithography exposure]]
[[Category: Lithography|Exposure]]
[[index.php?title=Category:Lithography|Exposure]]


__TOC__
__TOC__
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=Mask Aligner vs Maskless Aligner=
=Mask Aligner vs Maskless Aligner=


Slides presented at NNUM in Uppsala 2026: [[media:MA6 vs MLA 2026_v09.pdf|'''MA6 vs MLA 2026_v09''']]
Slides presented at NNUM in Uppsala 2026: [[index.php?title=Media:MA6 vs MLA 2026 v09.pdf|'''MA6 vs MLA 2026_v09''']]


Mask design used in the investigation: [[media:LithoTestAlign_2025_v10.gds|LithoTestAlign_2025_v10.gds]]
Mask design used in the investigation: [[index.php?title=Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]]


=Additional data=
=Additional data=
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* Table with optimal parameters and resolution for different aligners
* Table with optimal parameters and resolution for different aligners
* SEM pictures
* SEM pictures
{| class="wikitable"
|+
!Exposure equipment
!Dose
!Contact/Defoc
!Resolution
!Comment
|-
|Aligner: MA6-2
|100
|Vacuum
|1µm
|
|-
|Aligner: MA6-1
|100
|Vacuum
|1.25µm
|Probably over-exposed
|-
|Aligner: Maskless 02 (MLA2)
|90
|2
|1.25µm
|
|}
<br clear="all" />
<br clear="all" />


Revision as of 14:19, 15 June 2026

The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.

Feedback to this page: click here

Lithography exposure Exposure

Mask Aligner vs Maskless Aligner

Slides presented at NNUM in Uppsala 2026: MA6 vs MLA 2026_v09

Mask design used in the investigation: LithoTestAlign_2025_v10.gds

Additional data

THIS PAGE IS UNDER CONSTRUCTION

AZ 5214E

Resolution

  • Table with optimal parameters and resolution for different aligners
  • SEM pictures
Exposure equipment Dose Contact/Defoc Resolution Comment
Aligner: MA6-2 100 Vacuum 1µm
Aligner: MA6-1 100 Vacuum 1.25µm Probably over-exposed
Aligner: Maskless 02 (MLA2) 90 2 1.25µm


1µm triplets 2µm triplets 4µm triplets Lines Trenches
Aligner: MA6-2

100mJ/cm2, vacuum contact

Aligner: MA6-1

100mJ/cm2, vacuum contact (probably over-exposed)

Aligner: Maskless 02 (MLA2)

90mJ/cm2, defoc 2


Yield

The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.

Wafer maps at optimal processing conditions for different aligners
Aligner: Maskless 02 (MLA2) (Dose 90mJ/cm2; defoc 2).
Resolution: 1.22µm average; 0.1µm standard deviation.
Yield at 1.25µm: 99%		 Aligner: MA6-2 (Dose 100mJ/cm2; vacuum contact).
Resolution: 1.02µm average; 0.1µm standard deviation.
Yield at 1.25µm: 100%		 Aligner: MA6-1 (Dose 100mJ/cm2; vacuum contact). Probably over-exposed.
Resolution: 1.30µm average; 0.2µm standard deviation.
Yield at 1.25µm: 59%


Effect of exposure mode for mask aligner

Wafer maps at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm2)
Hard contact.
Resolution: 1.17µm average; 0.2µm standard deviation.
Yield at 1.25µm: 89%		 Soft contact.
Resolution: 3.77µm average; 0.7µm standard deviation.
Yield at 2.5µm: 4%		 10µm proximity.
Resolution: 4.19µm average; 0.7µm standard deviation.
Yield at 2.5µm: 3%


Wafer maps at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm2, probably over-exposed)
Hard contact.
Resolution: 1.58µm average; 0.5µm standard deviation.
Yield at 1.25µm: 48%		 Soft contact.
Resolution: 2.36µm average; 0.4µm standard deviation.
Yield at 2.5µm: 80%
At dose 92mJ/cm2, the average resolution decreases to 1.91µm and the yield at 2.5µm increases to 100%		 10µm proximity.
Resolution: 2.73µm average; 0.6µm standard deviation.
Yield at 2.5µm: 53%


Effect of WEC pressure for mask aligner (after WEC head service)

Wafer maps at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm2)
Soft contact, 0.15bar WEC pressure.
Resolution: 3.92µm average; 0.9µm standard deviation.
Yield at 2.5µm: 8%		 Soft contact, 0.40bar WEC pressure.
Resolution: 2.19µm average; 0.5µm standard deviation.
Yield at 2.5µm: 86%
10µm proximity, 0.15bar WEC pressure.
Resolution: 3.22µm average; 0.8µm standard deviation.
Yield at 2.5µm: 34%		 10µm proximity, 0.40bar WEC pressure.
Resolution: 2.83µm average; 0.6µm standard deviation.
Yield at 2.5µm: 66%


Resist profile (linewidth and sidewall angle)

  • SEM pictures to support graphs?
Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).


Linewidth and sidewall angle vs. defocus value for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm2.
Blue circles: Width of 2µm line.
Orange Squares: Sidewall angle.


AZ MiR 701

Resolution

  • Table with optimal parameters and resolution for different aligners
  • SEM pictures

Resist profile (sidewall angle and linewidth)

  • SEM pictures to support graphs?
Width of 2µm line vs. exposure dose for 1.5µm AZ MiR 701.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Sidewall angle vs. exposure dose for 1.5µm AZ MiR 701.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Linewidth and sidewall angle vs. defocus value for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 275mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.


AZ nLOF 2020

Resolution

  • Table with optimal parameters and resolution for different aligners
  • SEM pictures

Resist profile (sidewall angle and linewidth)

  • SEM pictures to support graphs?
Width of 2µm line vs. exposure dose for 2µm AZ nLOF 2020.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2).
Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).
Sidewall angle vs. exposure dose for 2µm AZ nLOF 2020.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2).
Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).
Linewidth and sidewall angle vs. defocus value for 2µm AZ nLOF exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.
Linewidth and sidewall angle vs. defocus value for 2µm AZ nLOF exposed in Aligner: Maskless 02 (MLA2) using dose 450mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.


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