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Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,655 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,655 edits
Line 51: Line 51:
100mJ/cm<sup>2</sup>, vacuum contact
100mJ/cm<sup>2</sup>, vacuum contact
(probably over-exposed)
(probably over-exposed)
|[[Image:W32 PFL 5214 D100 vac C6B_02.tif|350px]]
|[[File:W32 PFL 5214 D100 vac C6B_02.tif|350px]]
|[[Image:W32 PFL 5214 D100 vac C6B_01.tif|350px]]
|[[Image:W32 PFL 5214 D100 vac C6B_01.tif|350px]]
|[[Image:W32 PFL 5214 D100 vac C6B_03.tif|350px]]
|[[Image:W32 PFL 5214 D100 vac C6B_03.tif|350px]]
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