Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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 *SEM pictures to support graphs?
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-[[Image:5214E_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]]
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-|+'''Lithographic result vs. exposure dose. Data by Thomas Anhøj @ DTU Nanolab, 2026.'''
+|+'''Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>.'''
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-|[[Image:5214E_Linewidth vs dose.jpg|450px]]
+|[[Image:5214E_Profile vs defoc.jpg|500px]]
-|[[Image:5214E_Sidewall vs dose.jpg|450px]]
 |- align="center"
-| Width of 2µm line vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). || Sidewall angle vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
+| Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
+|}
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