Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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-===Resist profile (sidewall angle and linewidth)===
+===Resist profile (linewidth and sidewall angle)===
 *SEM pictures to support graphs?
-[[Image:5214E_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
+{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
+! width="510" |
-[[Image:5214E_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
+|+'''Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E.'''
+|- border="0" align="center"
+|[[Image:5214E_Linewidth vs dose.jpg|500px]]
+|[[Image:5214E_Sidewall vs dose.jpg|500px]]
+|- align="center"
+| colspan="2" | Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
+|}
+<br clear="all" />
 [[Image:5214E_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]]