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Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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'''Effect of exposure mode for mask aligner:'''
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'''Effect of WEC pressure for mask aligner:'''


===Resist profile (sidewall angle and linewidth)===
===Resist profile (sidewall angle and linewidth)===

Revision as of 17:09, 10 June 2026

The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.

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Mask Aligner vs Maskless Aligner

Slides presented at NNUM in Uppsala 2026: MA6 vs MLA 2026_v09

Mask design used in the investigation: LithoTestAlign_2025_v10.gds

Additional data

THIS PAGE IS UNDER CONSTRUCTION

AZ 5214E

Resolution

  • Table with optimal parameters and resolution for different aligners
  • SEM pictures


Yield

  • Wafer maps of:
    • Aligner: Maskless 02 (MLA2)
    • Aligner: MA6-1
    • Aligner: MA6-2 before service
    • Aligner: MA6-2 after service + WEC pressure


Wafer maps at optimal processing conditions for different aligners
Aligner: Maskless 02 (MLA2) (Dose 90mJ/cm2; defoc 2).
Resolution: 1.22µm average; 0.1µm standard deviation.
Yield at 1.25µm: 99%		 Aligner: MA6-2 (Dose 100mJ/cm2; vacuum contact).
Resolution: 1.02µm average; 0.1µm standard deviation.
Yield at 1.25µm: 100%		 Aligner: MA6-1 (Dose 100mJ/cm2; vacuum contact). Probably over-exposed.
Resolution: 1.30µm average; 0.2µm standard deviation.
Yield at 1.25µm: 59%


Effect of exposure mode for mask aligner:

Wafer maps at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm2)
Hard contact.
Resolution: 1.17µm average; 0.2µm standard deviation.
Yield at 1.25µm: 89%		 Soft contact.
Resolution: 3.77µm average; 0.7µm standard deviation.
Yield at 2.5µm: 4%		 10µm proximity.
Resolution: 4.19µm average; 0.7µm standard deviation.
Yield at 2.5µm: 3%


Wafer maps at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm2, probably over-exposed)
Hard contact.
Resolution: 1.58µm average; 0.5µm standard deviation.
Yield at 1.25µm: 48%		 Soft contact.
Resolution: 2.36µm average; 0.4µm standard deviation.
Yield at 2.5µm: 80%
At dose 92mJ/cm2, the average resolution decreases to 1.91µm and the yield at 2.5µm increases to 100%		 10µm proximity.
Resolution: 2.73µm average; 0.6µm standard deviation.
Yield at 2.5µm: 53%


Effect of WEC pressure for mask aligner:

Resist profile (sidewall angle and linewidth)

  • SEM pictures to support graphs?
Width of 2µm line vs. exposure dose for 1.5µm AZ 5214E.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Sidewall angle vs. exposure dose for 1.5µm AZ 5214E.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Linewidth and sidewall angle vs. defocus value for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.


AZ MiR 701

Resolution

  • Table with optimal parameters and resolution for different aligners
  • SEM pictures

Resist profile (sidewall angle and linewidth)

  • SEM pictures to support graphs?
Width of 2µm line vs. exposure dose for 1.5µm AZ MiR 701.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Sidewall angle vs. exposure dose for 1.5µm AZ MiR 701.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Linewidth and sidewall angle vs. defocus value for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 275mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.


AZ nLOF 2020

Resolution

  • Table with optimal parameters and resolution for different aligners
  • SEM pictures

Resist profile (sidewall angle and linewidth)

  • SEM pictures to support graphs?
Width of 2µm line vs. exposure dose for 2µm AZ nLOF 2020.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2).
Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).
Sidewall angle vs. exposure dose for 2µm AZ nLOF 2020.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2).
Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).
Linewidth and sidewall angle vs. defocus value for 2µm AZ nLOF exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.
Linewidth and sidewall angle vs. defocus value for 2µm AZ nLOF exposed in Aligner: Maskless 02 (MLA2) using dose 450mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.


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