Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions
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==Etching of nanostructures in silicon using the ICP Metal Etcher== | ===Etching of nanostructures in silicon using the ICP Metal Etcher=== | ||
A series of experiments with etching nanostructures in silicon has been carried out. The common process parameters are: | A series of experiments with etching nanostructures in silicon has been carried out. The common process parameters are: | ||