Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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| Hard contact <br/>Resolution: 1.17µm average; 0.2µm standard deviation. <br/>Yield at 1.25µm: 89% || Soft contact <br/>Resolution: 3.77µm average; 0.7µm standard deviation. <br/>Yield at 2.5µm: 4% || 10µm proximity <br/>Resolution: 4.19µm average; 0.7µm standard deviation. <br/>Yield at 2.5µm: 3% | | Hard contact <br/>Resolution: 1.17µm average; 0.2µm standard deviation. <br/>Yield at 1.25µm: 89% || Soft contact <br/>Resolution: 3.77µm average; 0.7µm standard deviation. <br/>Yield at 2.5µm: 4% || 10µm proximity <br/>Resolution: 4.19µm average; 0.7µm standard deviation. <br/>Yield at 2.5µm: 3% | ||
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|+'''Wafer maps at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm<sup>2</sup>, probably over-exposed)''' | |||
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|[[Image:Map_MA6-1_hard.jpg|450px]] | |||
|[[Image:Map_MA6-1_soft.jpg|450px]] | |||
|[[Image:Map_MA6-1_prox.jpg|450px]] | |||
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| Hard contact <br/>Resolution: 1.58µm average; 0.5µm standard deviation. <br/>Yield at 1.25µm: 48% || Soft contact <br/>Resolution: 2.36µm average; 0.4µm standard deviation. <br/>Yield at 2.5µm: 80% <br/>At dose 92mJ/cm<sup>2</sup>, the average resolution decreases to 1.91µm and the yield increases to 100% || 10µm proximity <br/>Resolution: 2.73µm average; 0.6µm standard deviation. <br/>Yield at 2.5µm: 53% | |||
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