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Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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3,602 edits
Line 38: Line 38:
|+'''Wafer maps at optimal processing conditions for different aligners'''
|+'''Wafer maps at optimal processing conditions for different aligners'''
|- border="0" align="center"
|- border="0" align="center"
|[[Map_MLA2_D90_F2.jpg|300px]]
|[[Image:Map_MLA2_D90_F2.jpg|300px]]
|[[Map_MA6-2_vacuum.jpg|300px]]
|[[Image:Map_MA6-2_vacuum.jpg|300px]]
|[[Map_MA6-1_vacuum.jpg|300px]]
|[[Image:Map_MA6-1_vacuum.jpg|300px]]


|- align="center"
|- align="center"
| Aligner: MAskless 02 (MLA2). ||  Aligner: MA6-2 || Aligner: MA6-1
| Aligner: Maskless 02 (MLA2). ||  Aligner: MA6-2 || Aligner: MA6-1


|}
|}

Revision as of 16:31, 10 June 2026

The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.

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Mask Aligner vs Maskless Aligner

Slides presented at NNUM in Uppsala 2026: MA6 vs MLA 2026_v09

Mask design used in the investigation: LithoTestAlign_2025_v10.gds

Additional data

THIS PAGE IS UNDER CONSTRUCTION

AZ 5214E

Resolution

  • Table with optimal parameters and resolution for different aligners
  • SEM pictures


Yield

  • Wafer maps of:
    • Aligner: Maskless 02 (MLA2)
    • Aligner: MA6-1
    • Aligner: MA6-2 before service
    • Aligner: MA6-2 after service + WEC pressure


Wafer maps at optimal processing conditions for different aligners
Aligner: Maskless 02 (MLA2). Aligner: MA6-2 Aligner: MA6-1


Resist profile (sidewall angle and linewidth)

  • SEM pictures to support graphs?
Width of 2µm line vs. exposure dose for 1.5µm AZ 5214E.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Sidewall angle vs. exposure dose for 1.5µm AZ 5214E.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Linewidth and sidewall angle vs. defocus value for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.


AZ MiR 701

Resolution

  • Table with optimal parameters and resolution for different aligners
  • SEM pictures

Resist profile (sidewall angle and linewidth)

  • SEM pictures to support graphs?
Width of 2µm line vs. exposure dose for 1.5µm AZ MiR 701.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Sidewall angle vs. exposure dose for 1.5µm AZ MiR 701.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Linewidth and sidewall angle vs. defocus value for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 275mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.


AZ nLOF 2020

Resolution

  • Table with optimal parameters and resolution for different aligners
  • SEM pictures

Resist profile (sidewall angle and linewidth)

  • SEM pictures to support graphs?
Width of 2µm line vs. exposure dose for 2µm AZ nLOF 2020.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2).
Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).
Sidewall angle vs. exposure dose for 2µm AZ nLOF 2020.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2).
Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).
Linewidth and sidewall angle vs. defocus value for 2µm AZ nLOF exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.
Linewidth and sidewall angle vs. defocus value for 2µm AZ nLOF exposed in Aligner: Maskless 02 (MLA2) using dose 450mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.


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