Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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 ** Aligner: MA6-2 before service
 ** Aligner: MA6-2 after service + WEC pressure
+<br clear="all" />
+{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
+! width="320" |
+! width="320" |
+! width="320" |
+|+'''Wafer maps at optimal processing conditions for different aligners'''
+|- border="0" align="center"
+|[[Map_MLA2_D90_F2.jpg|300px]]
+|[[Map_MA6-2_vacuum.jpg|300px]]
+|[[Map_MA6-1_vacuum.jpg|300px]]
+|- align="center"
+| Aligner: MAskless 02 (MLA2). ||  Aligner: MA6-2 || Aligner: MA6-1
+|}
 <br clear="all" />