Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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===Resist profile (sidewall angle and linewidth)=== | ===Resist profile (sidewall angle and linewidth)=== | ||
[[Image:5214E_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]] | [[Image:5214E_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]] | ||
[[Image:5214E_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]] | [[Image:5214E_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]] | ||
[[Image:5214E_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value | [[Image:5214E_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]] | ||
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===Resolution=== | ===Resolution=== | ||
===Resist profile (sidewall angle and linewidth)=== | ===Resist profile (sidewall angle and linewidth)=== | ||
[[Image:MiR_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]] | |||
[[Image:MiR_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]] | |||
[[Image:MiR_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 275mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]] | |||
==AZ nLOF 2020== | ==AZ nLOF 2020== | ||
Revision as of 16:50, 8 June 2026
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Slides presented at NNUM in Uppsala 2026
Additional data
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AZ 5214E
Resolution and yield
- Aligner: Maskless 02 (MLA2)
- Aligner: MA6-2
- Aligner: MA6-1
Resist profile (sidewall angle and linewidth)
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.
AZ MiR 701
Resolution
Resist profile (sidewall angle and linewidth)
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.
AZ nLOF 2020
Resolution
Resist profile (sidewall angle and linewidth)
- Aligner: Maskless 01 (MLA1)
- Aligner: Maskless 02 (MLA2)
- Aligner: MA6-2