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===Resist profile (sidewall angle and linewidth)===
===Resist profile (sidewall angle and linewidth)===
{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
! width="350" |
! width="350" |
|+'''Lithographic result vs. exposure dose. Data by Thomas Anhøj @ DTU Nanolab, 2026.'''
|- border="0" align="center"
|[[Image:5214E_Linewidth vs dose.jpg|450px]]
|[[Image:5214E_Sidewall vs dose.jpg|450px]]
|- align="center"
| Width of 2µm line vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). || Sidewall angle vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
|}
* Aligner: Maskless 02 (MLA2)
* Aligner: Maskless 02 (MLA2)
* Aligner: MA6-2
* Aligner: MA6-2

Revision as of 15:36, 8 June 2026

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Slides presented at NNUM in Uppsala 2026

MA6 vs MLA 2026_v09

Additional data

THIS PAGE IS UNDER CONSTRUCTION

AZ 5214E

Resolution and yield

  • Aligner: Maskless 02 (MLA2)
  • Aligner: MA6-2
  • Aligner: MA6-1

Resist profile (sidewall angle and linewidth)

Lithographic result vs. exposure dose. Data by Thomas Anhøj @ DTU Nanolab, 2026.
Width of 2µm line vs. exposure dose.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Sidewall angle vs. exposure dose.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
  • Aligner: Maskless 02 (MLA2)
  • Aligner: MA6-2
  • Aligner: MA6-1

AZ MiR 701

Resolution

Resist profile (sidewall angle and linewidth)

  • Aligner: Maskless 02 (MLA2)
  • Aligner: MA6-2

AZ nLOF 2020

Resolution

Resist profile (sidewall angle and linewidth)

  • Aligner: Maskless 01 (MLA1)
  • Aligner: Maskless 02 (MLA2)
  • Aligner: MA6-2