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Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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=Additional data=
=Additional data=
<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]
<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]
==Mask Aligner==
===Resolution===
===Linewidth===
===Sidewall angle===
==Maskless Aligner==
===Resolution===
===Linewidth===
===Sidewall angle===


==AZ 5214E==
==AZ 5214E==
Line 31: Line 21:


==AZ MiR 701==
==AZ MiR 701==
===Resolution/yield===
===Resolution===
===Linewidth/bias===
===Linewidth/bias===
===Sidewall angle===
===Sidewall angle===


==AZ nLOF 2020==
==AZ nLOF 2020==
===Resolution/yield===
===Resolution===
===Linewidth/bias===
===Linewidth/bias===
===Sidewall angle===
===Sidewall angle===

Revision as of 09:24, 8 June 2026

The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.

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Slides presented at NNUM in Uppsala 2026

MA6 vs MLA 2026_v09

Additional data

THIS PAGE IS UNDER CONSTRUCTION

AZ 5214E

Resolution/yield

Linewidth/bias

Sidewall angle

AZ MiR 701

Resolution

Linewidth/bias

Sidewall angle

AZ nLOF 2020

Resolution

Linewidth/bias

Sidewall angle