Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
Appearance
No edit summary |
|||
| Line 23: | Line 23: | ||
===Resolution=== | ===Resolution=== | ||
===Linewidth=== | ===Linewidth=== | ||
===Sidewall angle=== | |||
==AZ 5214E== | |||
===Resolution/yield=== | |||
===Linewidth/bias=== | |||
===Sidewall angle=== | |||
==AZ MiR 701== | |||
===Resolution/yield=== | |||
===Linewidth/bias=== | |||
===Sidewall angle=== | |||
==AZ nLOF 2020== | |||
===Resolution/yield=== | |||
===Linewidth/bias=== | |||
===Sidewall angle=== | ===Sidewall angle=== | ||
Revision as of 09:22, 8 June 2026
The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.
Feedback to this page: click here
Slides presented at NNUM in Uppsala 2026
Additional data
THIS PAGE IS UNDER CONSTRUCTION