Specific Process Knowledge/Characterization/SEM Supra 2: Difference between revisions
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*1-2 nm (limited by vibrations) | *1-2 nm (limited by vibrations) | ||
The resolution is strongly dependent on the type | The resolution is strongly dependent on the SEM settings, the sample type and the skills of the operator | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics | !style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics | ||
|style="background:LightGrey; color:black"|Detectors | |style="background:LightGrey; color:black"|Detectors | ||
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*Secondary electron ( | *Secondary electron (SE2) | ||
*Inlens secondary electron (Inlens) | *Inlens secondary electron (Inlens) | ||
*Variable pressure secondary electron (VPSE) | *Variable pressure secondary electron (VPSE) | ||
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|style="background:LightGrey; color:black"|Stage | |style="background:LightGrey; color:black"|Stage | ||
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*X, Y: 150 × 150 mm | *X, Y: 150 mm × 150 mm | ||
*T: -10 to 70<sup>o</sup> | *T: -10 to 70<sup>o</sup> | ||
*R: 360<sup>o</sup> | *R: 360<sup>o</sup> | ||
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|style="background:LightGrey; color:black"|Operating pressures | |style="background:LightGrey; color:black"|Operating pressures | ||
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*Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | *Fixed at High vacuum (2 × 10<sup>-4</sup >mbar - 10<sup>-6</sup> mbar) | ||
*Variable at Low vacuum (0.1 mbar - 2 mbar) | *Variable at Low vacuum (0.1 mbar - 2 mbar) | ||
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*Antivibration platform | *Antivibration platform | ||
*Fjeld M-200 airlock taking up to 8" wafers | *Fjeld M-200 airlock taking up to 8" wafers | ||
*Oxford Instruments | *Oxford Instruments Aztec Advanced Ultim 65 mm<sup>2</sup> SDD EDX detector and Aztec software package | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||