Specific Process Knowledge/Etch/Etching of Chromium: Difference between revisions
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|Dry plasma etch of Cr | |Dry plasma etch of Cr | ||
|Sputtering of Cr - pure physical etch | |Sputtering of Cr - pure physical etch | ||
|Primarily shallow etching of silicon but also thin layers of SiO2, TaO2 and Cr | |Primarily shallow dry etching of silicon but also thin layers of SiO2, TaO2 and Cr | ||
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