Specific Process Knowledge/Thin film deposition/Deposition of Gold: Difference between revisions
| Line 39: | Line 39: | ||
|10 Å to 600 nm * | |10 Å to 600 nm * | ||
|10 Å to 200 nm | |10 Å to 200 nm | ||
|10 Å to 500 nm | |10 Å to 500 nm * | ||
|10 Å to 500 nm | |10 Å to 500 nm * | ||
| very thin, few nm range | | very thin, few nm range | ||
| very thin, few nm range | | very thin, few nm range | ||
| Line 131: | Line 131: | ||
''' | '''*''' ''For thicknesses above 200 nm write to metal@nanolab.dtu.dk as extra deposition costs a higher fee.'' | ||
== Resistive thermal evaporation of Au == | == Resistive thermal evaporation of Au == | ||