Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions
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All recipes use the following structure: | All recipes use the following structure: | ||
#Pressurize the TMAH canister | #Pressurize the TMAH canister | ||
#Pre-wet substrate at high RPM | |||
#Dispense puddle while rotating substrate slowly | #Dispense puddle while rotating substrate slowly | ||
#Puddle development with agitation of substrate | #Puddle development with agitation of substrate | ||