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Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
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! style="text-align:left" | Tool modification:  
! style="text-align:left" | Tool modification:  
| style="padding-left: 10px" | Modified from e-beam solvent developer to UV TMAH developer in 2024
| style="padding-left: 10px" |  
Converted from e-beam solvent developer to UV TMAH developer in 2024<br>
Added media flow controllers for developer, rinse and dry media in 2025
|-
|-
! style="text-align:left" | Location:  
! style="text-align:left" | Location:  
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