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Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
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| colspan="2"|100 mm SSP silicon
| colspan="2"|100 mm SSP silicon
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|-
! scope=row style="text-align: left;" | Resist
! scope=row style="text-align: left;" | Resist film
| colspan="2"|AZ 5214E
| colspan="2"|1.5 µm AZ 5214E
|-
|-
! scope=row style="text-align: left;" | Exposure dose
! scope=row style="text-align: left;" | Exposure dose
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