Specific Process Knowledge/Lithography/UVExposure/aligner MLA1: Difference between revisions
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[[Image:Heidelberg_MLA100.jpg|400px|thumb|Aligner: Maskless 01 is located in E-4.]] | [[Image:Heidelberg_MLA100.jpg|400px|thumb|Aligner: Maskless 01 is located in E-4.]] | ||
The MLA 100 Maskless Aligner located in the E-4 cleanroom is a direct exposure lithography tool installed in 2017. | The MLA 100 Maskless Aligner located in the E-4 cleanroom is a direct exposure lithography tool installed in 2017. | ||