Specific Process Knowledge/Lithography/UVExposure/aligner inclinedUV: Difference between revisions
Created page with "==Inclined UV Lamp== 300x300px|right|thumb|Inclined UV lamp is placed in CX-1 The Inclined UV lamp is 1000 W Hg(Xe)lamp source designed for near UV, 350-450nm, mid UV, 260-320nm, and deep UV, 220-260nm exposures of resists and polymers. The exposure source can also be used to make an inclined exposure in air or in the media tank. The tool was purchased in February 2009 from Newport. The exposure lamp official name is Oriel Flood Exposur..." |
No edit summary |
||
| Line 1: | Line 1: | ||
=Inclined UV Lamp= | |||
[[Image:Inclined UV lamp_1.jpg|300x300px|right|thumb|Inclined UV lamp is placed in CX-1]] | [[Image:Inclined UV lamp_1.jpg|300x300px|right|thumb|Inclined UV lamp is placed in CX-1]] | ||
| Line 12: | Line 12: | ||
<br clear="all" /> | <br clear="all" /> | ||
=Equipment performance and process related parameters= | |||
{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | {|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | ||
