Specific Process Knowledge/Lithography/UVExposure/aligner MLA1: Difference between revisions
Created page with "== Aligner: Maskless 01 == 400px|thumb|Aligner: Maskless 01 is located in E-4. The logon password for the PC is "mla" (without quotation marks). The MLA 100 Maskless Aligner located in the E-4 cleanroom is a direct exposure lithography tool installed in 2017. It is a UV LED exposure system, that exposes the patterns directly on photosensitive resists on chips, 2, 4, and 6 inch substrates, without prior fabrication of the mask. The sys..." |
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===Exposure dose and defocus=== | ===Exposure dose and defocus=== | ||
[[Specific Process Knowledge/Lithography/Resist#Aligner:_Maskless_01|Information on UV exposure dose]] | [[Specific Process Knowledge/Lithography/Resist/UVresist/exposureDoseMasklessAligners#Aligner:_Maskless_01|Information on UV exposure dose]] | ||
===[[Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing|Process information]]=== | ===[[Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing|Process information]]=== | ||
