Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions
Created page with "==Developer: TMAH Manual 02== 400px|right|thumb|Developer: TMAH Manual 02 is located in E-4. Developer: TMAH Manual 02 is a manually operated puddle developer for single wafers or chips. The wafers or chips are loaded manually one by one into the developer, but the developer dispense, puddle time, water rinse, and drying is performed automatically. The development uses the TMAH based AZ 726 MIF developer (2.38 % TMAH in water with a small amoun..." |
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==Developer: TMAH Manual 02== | ==Developer: TMAH Manual 02== | ||
[[ | [[file:Developer_TMAH_manual_02.jpg|400px|right|thumb|Developer: TMAH Manual 02 is located in E-4.]] | ||
Developer: TMAH Manual 02 is a manually operated puddle developer for single wafers or chips. The wafers or chips are loaded manually one by one into the developer, but the developer dispense, puddle time, water rinse, and drying is performed automatically. | Developer: TMAH Manual 02 is a manually operated puddle developer for single wafers or chips. The wafers or chips are loaded manually one by one into the developer, but the developer dispense, puddle time, water rinse, and drying is performed automatically. | ||
