Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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	== Development ==		== Development ==

	AR 600-~~546~~ and ZED N-50 developers are available in a semi automatic puddle developer [[Specific_Process_Knowledge/Lithography/Development#Developer:_E-~~beam~~\|Developer: E-beam]] in E-4, mainly intended for development of AR-P 6200 and ZEP 520A. It has automatic recipes for puddle development cycles for 10, 30 and 60 seconds of either of the two developers, each finishing off with an IPA rinse and drying cycle. The system can handle chips, 2", 4" and 6" wafers.		AR 600-50 and ZED N-50 developers are available in a semi automatic puddle developer [[Specific_Process_Knowledge/Lithography/Development#Developer:_E-beam_02\|Developer: E-beam 02]] in E-4, mainly intended for development of AR-P 6200 and ZEP 520A. It has automatic recipes for puddle development cycles for 10, 30 and 60 seconds of either of the two developers, each finishing off with an IPA rinse and drying cycle. The system can handle chips, 2", 4", 6" and 8" wafers.