Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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===Aligner: MA6-1=== | ===Aligner: MA6-1=== | ||
The Aligner: MA6-1 has an i-line notch filter installed. This | The Aligner: MA6-1 has an i-line notch filter installed. This produces an exposure light peak around 365 nm with a FWHM of 7 nm. | ||
{| | '''Quality control'''<br> | ||
Please note that the values listed in the table are <i>'''not'''</i> routinely tested as part of quality control. | |||
{| class="wikitable" | |||
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! !! Date !! Operator !! Film thickness !! Exposure mode !! Dose !! Resolution !! Comments | |||
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| | ! scope=row| AZ MIR 701 | ||
| | | Long ago || ? || 1.5 µm || ? || 180 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Post exposure bake: 60 s @ 110°C<br>Development: 60 s puddle | ||
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! scope=row| AZ MIR 701 | |||
| Long ago || ? || 2.0 µm || ? || 200 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Post exposure bake: 60 s @ 110°C<br>Development: 60 s puddle | |||
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! scope=row| AZ MIR 701 | |||
! | | Long ago || ? || 4.0 µm || ? || 400 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Post exposure bake: 60 s @ 110°C<br>Development: 60 s puddle | ||
|Long ago | |||
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! scope=row| AZ 5214E | |||
| Long ago || ? || 1.5 µm || ? || 72 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Development: 60 s puddle | |||
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| | ! scope=row| AZ 5214E | ||
| Long ago || ? || 2.2 µm || ? || 80 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Development: 60 s puddle | |||
|Long ago | |||
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! scope=row| AZ 5214E | |||
| Long ago || ? || 4.2 µm || ? || 160 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Development: 60 s puddle | |||
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! scope=row| AZ 5214E<br>Image reversal | |||
! | | Long ago || ? || 2.2 µm || ? || ? mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Reversal bake: 60 s @ 110°C<br>Flood exposure: 500 mJ/cm<sup>2</sup><br>Development: 60 s puddle | ||
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! scope=row| AZ nLOF 2020 | |||
| Long ago || ? || 2.0 µm || ? || 121 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Post exposure bake: 60 s @ 110°C<br>Development: 60 s puddle<br><br>Side wall angle: ~15°<br>For smaller angle (~5°): develop 30 seconds instead | |||
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| | ! scope=row| AZ 4562 | ||
| Long ago || ? || 10 µm || ? || 510 mJ/cm<sup>2</sup> || ≤5 µm || '''Not under regular quality control'''<br><br>Priming: HMDS<BR>Rehydration after SB: none<br>Exposure: Multiple exposures with 15 s pauses is recommended<br>Degassing after exposure: none<br>Development: 5 x 60 s multi puddle | |||
|Long ago | |} | ||
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'''New resists version in 2023'''<br> | |||
As of 2023-03-21 we no longer have any of the old versions of the resists: AZ 5214E, AZ 4562, AZ MiR 701. This table contains only information about the <i>old</i> resist versions. | |||
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===Aligner: MA6-2=== | ===Aligner: MA6-2=== | ||