Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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===Aligner: Maskless 03=== | ===Aligner: Maskless 03=== | ||
The Aligner: Maskless 03 has a 405 nm laser light source with a FWHM of ~1 nm. All exposures on this tool are made using the pneumatic autofocus system. | The Aligner: Maskless 03 has a 405 nm laser light source with a FWHM of ~1 nm. All exposures on this tool are made using the pneumatic autofocus system. | ||
'''Quality control'''<br> | '''Quality control'''<br> | ||
Please note that the values listed | Please note that the values listed in the table are <i>'''not'''</i> routinely tested as part of quality control, except for the resist AZ 5214E. | ||
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'''New resists'''<br> | '''New resists version in 2023'''<br> | ||
As of 2023-03-21 we no longer have any of the old versions of the resists: AZ 5214E, AZ 4562, AZ MiR 701. This table contains only information about the new resist versions. | As of 2023-03-21 we no longer have any of the old versions of the resists: AZ 5214E, AZ 4562, AZ MiR 701. This table contains only information about the new resist versions. | ||