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Specific Process Knowledge/Pattern Design: Difference between revisions

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Jehan (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891, Bureaucrats, danchip, Administrators
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=== Alignment marks for E-beam lithography ===
=== Alignment marks for E-beam lithography ===
If your UV mask is used to define wafers marks in e-beam lithography with JEOL JBX-9500, you should design your alignment marks in a way the JEOL JBX-9500 recognizes. Please follow the guide [https://Specific%20Process%20Knowledge/Lithography/EBeamLithography/JEOLAlignment for alignment here].[http://Specific%20Process%20Knowledge/Lithography/EBeamLithography/JEOLAlignment Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment]
If your UV mask is used to define wafers marks in e-beam lithography with JEOL JBX-9500, you should design your alignment marks in a way the JEOL JBX-9500 recognizes. Please follow the guide [[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOLAlignment|to e-beam alignment here]]
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