Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions
| Line 123: | Line 123: | ||
|- | |- | ||
! Cl<sub>2</sub> (sccm) | ! Cl<sub>2</sub> (sccm) | ||
| | | 65 | ||
|- | |- | ||
! | ! O<sub>2</sub> (sccm) | ||
| | | 15 | ||
|- | |- | ||
! Pressure (mTorr) | ! Pressure (mTorr) | ||
| | | 15 | ||
|- | |- | ||
! Coil power (W) | ! Coil power (W) | ||
| | | 500 | ||
|- | |- | ||
! Platen power (W) | ! Platen power (W) | ||
| | | 15 | ||
|- | |- | ||
! Temperature (<sup>o</sup>C) | ! Temperature (<sup>o</sup>C) | ||
| 50 | | 50 (no back side cooling | ||
|- | |- | ||
! Spacers (mm) | ! Spacers (mm) | ||