Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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t = D*A/I | t = D*A/I | ||
It is thus essential to find the right balance between the area that needs to be defined and a beam current that will provide sufficient pattern fidelity and quality. During pattern writing the tool will also use time on cyclic calibration and stage movement as defined by the job path and pattern layout. The exposure time can be estimated based | It is thus essential to find the right balance between the area that needs to be defined and a beam current that will provide sufficient pattern fidelity and quality. During pattern writing the tool will also use time on cyclic calibration and stage movement as defined by the job path and pattern layout. [https://labmanager.dtu.dk/function.php?module=Machine&view=jeol_writing_time The exposure time can be estimated based here.] | ||
= Exposure information = | = Exposure information = | ||