Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions
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===Chromium etch=== | ===Chromium etch=== | ||
The Chromium etch has ONLY been carried out on the following substrate stack: | |||
The Chromium is sputter deposited onto a 2" quartz wafer and pattered by e-beam with Zep520A resist. | |||
This 2" QZ wafer is bonded with crystal bond to a 65mmx65mm quartz plate with the thickness: 6.35mm. | |||
This QZ plate is bonded to a Si wafer. | |||
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | {| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | ||
|+ '''Cr etch''' | |+ '''Cr etch''' | ||