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Specific Process Knowledge/Etch/Etching of Titanium: Difference between revisions

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{| border="1" cellspacing="0" cellpadding="4" align="left"
{| border="1" cellspacing="0" cellpadding="4" align="left"
!  
!  
! BHF
! width="200" | BHF
! Cold RCA1  
! width="200" | Cold RCA1  
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|-  
|'''General description'''
|'''General description'''
|
| Etch of titanium with or without photoresist mask.
Etch of titanium with or without photoresist mask.
| Etch of titanium (as stripper or with eagle resist).
|
Etch of titanium (as stripper or with eagle resist).
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|-
|'''Chemical solution'''
|'''Chemical solution'''
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== Dry etching of titanium ==
== Dry etching of titanium ==


See the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] page.
See the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] page.