Specific Process Knowledge/Lithography/Baking: Difference between revisions
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==SU-8 hotplates | ==SU-8 hotplates== | ||
[[Image:SU-8hotplates.jpg|300x300px|thumb|Hotplate 1 (SU8) and Hotplate 2 (SU8) | [[Image:SU-8hotplates.jpg|300x300px|thumb|Hotplate 1 (SU8) and Hotplate 2 (SU8) (the old set-up in C-1)]] | ||
We have | We have four hotplates dedicated to baking of SU-8. | ||
<br>Hotplate 1 (SU8) and Hotplate 2 (SU8) are located in cleanroom E-4. | |||
<br>Hotplate 3 (SU8) and Hotplate 4 (SU8) are located in PolyFabLab in building 347. | |||
Users can control the ramp-time, the baking temperature, and the baking time. | Users can control the ramp-time, the baking temperature, and the baking time. | ||
<br>The hotplates are temperature limited to 180°C. | |||
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[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=453 Hotplate 3 (SU8)] - '''requires login''' | [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=453 Hotplate 3 (SU8)] - '''requires login''' | ||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=454 Hotplate 4 (SU8)] - '''requires login''' | |||
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