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Specific Process Knowledge/Lithography/Baking: Difference between revisions

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==SU-8 hotplates 1, 2 & 3==
==SU-8 hotplates==
[[Image:SU-8hotplates.jpg|300x300px|thumb|Hotplate 1 (SU8) and Hotplate 2 (SU8) situated in C-1]]
[[Image:SU-8hotplates.jpg|300x300px|thumb|Hotplate 1 (SU8) and Hotplate 2 (SU8) (the old set-up in C-1)]]
We have three dedicated SU-8 hotplates in C-1 and E-4.
We have four hotplates dedicated to baking of SU-8.
<br>Hotplate 1 (SU8) and Hotplate 2 (SU8) are located in cleanroom E-4.
<br>Hotplate 3 (SU8) and Hotplate 4 (SU8) are located in PolyFabLab in building 347.


Users can control the ramp-time, the baking temperature, and the baking time.
Users can control the ramp-time, the baking temperature, and the baking time.
In order to avoid thermal curing of SU-8 residues on the hotplates, they are temperature limited to 180°C.
<br>The hotplates are temperature limited to 180°C.




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[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=453 Hotplate 3 (SU8)] - '''requires login'''
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=453 Hotplate 3 (SU8)] - '''requires login'''
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=454 Hotplate 4 (SU8)] - '''requires login'''
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