Jump to content

Specific Process Knowledge/Etch/Etching of Chromium: Difference between revisions

BGE (talk | contribs)
Jml (talk | contribs)
No edit summary
Line 1: Line 1:
==Etching of Chromium==
==Wet etching of Chromium==
[[Image:fumehoodetch-chrom.jpg|300x300px|thumb|Fume hood: positioned in cleanroom 2. <br />Wet Etch of Chromium can take place in a beaker in this fume hood]]
[[Image:fumehoodetch-chrom.jpg|300x300px|thumb|Fume hood: positioned in cleanroom 2. <br />Wet Etch of Chromium can take place in a beaker in this fume hood]]
Etching of chromium is done wet at Danchip making your own set up in a beaker in a fume hood - preferably in cleanroom 2 or 4. We have two solution for this:
Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in cleanroom 2 or 4. We have two solution for this:


# HNO<math>_3</math>:H<math>_2</math>O:cerisulphate  - 90ml:1200ml:15g - standard at Danchip
# HNO<math>_3</math>:H<math>_2</math>O:cerisulphate  - 90ml:1200ml:15g - standard at Danchip
Line 73: Line 73:
|-
|-
|}
|}
== Dry etching of chromium ==
On the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] tool a recipe for chromium is being developed.