Specific Process Knowledge/Lithography/EBeamLithography/HSQ Dose Test: Difference between revisions
| Line 12: | Line 12: | ||
Below is overview optical images of the developed pattern: | Below is overview optical images of the developed pattern: | ||
[[File:Dose test optical.png|frameless|625x625px|dose test optical images|left]] | [[File:Dose test optical.png|frameless|625x625px|dose test optical images|left]] | ||
SEM images were recorded and analyzed from the structure shown below: | SEM images were recorded and analyzed from the structure shown below: | ||
[[File:design.png|frameless| | [[File:design.png|frameless|383x383px|dose test optical images|left]] | ||
The measured and designed critical dimension are plotted vs the doses below: | The measured and designed critical dimension are plotted vs the doses below: | ||
[[File:CD vs dose.png|frameless| | [[File:CD vs dose.png|frameless|446x446px|dose test optical images|left]] | ||
The line width roughness (LWR) is plotted vs CD below: | The line width roughness (LWR) is plotted vs CD below: | ||
[[File:LWR vs CD.png|frameless| | [[File:LWR vs CD.png|frameless|462x462px|dose test optical images|left]] | ||
. | . | ||
Revision as of 14:14, 9 September 2025
Resist info
- we used a 10 % HSQ resist for a dose test. The resist info sheet could be found her.
- spinning: in labspin 3000rpm for 40s with 2s ramp (1500 acceleration) then bake for 2 min at 165 C
- Exposure: At 12nA ap6 (spot size 10 nm) in JEOL 9500
- Dose test with structures (3x3)
- Develop for 90s using manual TMAH developer
- Optical and SEM images and analysis
Results
Below is overview optical images of the developed pattern:
SEM images were recorded and analyzed from the structure shown below:
The measured and designed critical dimension are plotted vs the doses below:
The line width roughness (LWR) is plotted vs CD below:
.