Specific Process Knowledge/Wafer cleaning/RCA: Difference between revisions
mNo edit summary |
Added info about cleaning non standard size samples |
||
| Line 22: | Line 22: | ||
You can find the APV for the RCA bench [http://labmanager.dtu.dk/d4Show.php?id=1916&mach=243 here] | You can find the APV for the RCA bench [http://labmanager.dtu.dk/d4Show.php?id=1916&mach=243 here] | ||
===RCA procedure=== | === RCA procedure === | ||
*'''RCA1: 10 min''' | *'''RCA1: 10 min''' | ||
*DI water rinsing (dumping three times) | *DI water rinsing (dumping three times) | ||
| Line 33: | Line 33: | ||
For procedure details please look in the [http://labmanager.dtu.dk/d4Show.php?id=1633&mach=243 user manual] in LabManager. | For procedure details please look in the [http://labmanager.dtu.dk/d4Show.php?id=1633&mach=243 user manual] in LabManager. | ||
=== RCA Cleaning of non-standard sample size === | |||
There are different possibilities in the RCA bench and in beakers in the fumehood. Please contact Nanolab staff in this situation. | |||
'''The user manual, user APV and contact information can be found in LabManager:''' | '''The user manual, user APV and contact information can be found in LabManager:''' | ||